Chinese Scientists Develop Artificial Sapphire Dielectric Wafers
Aug 12, 2024
Chinese scientists have developed artificial sapphire dielectric wafers, laying a key foundation for low-power chip development. The latest achievement was published in the journal Nature on Wednesday. (CGTN)
Aluminum oxide materials feature good thermal and mechanical stability and they are difficult to participate directly in chemical reactions under mild conditions. A research group at Institute of Chemistry of Chinese Academy of Sciences led by Prof. HE Shenggui demonstrated that a single rhodium atom can promote the participation of five oxygen atoms to oxidize carbon monoxide molecules from a nine-atom rhodium–aluminum oxide cluster RhAl2O6+.
A team of Chinese scientists has made a significant stride in chip technology by developing dielectric wafers made of artificial sapphire. Their groundbreaking research, published in Nature on Wednesday, lays a crucial foundation for the development of more power-efficient chips.